Integration of Artificial Intelligence for Real-Time Fault Detection in Semiconductor Packaging

Abstract

Semiconductor manufacturing involves a complex sequence of unit processes, where even a minor error can disrupt the entire production chain. Present-day manufacturing setups rely on continuous data monitoring of equipment health, wafer measurements, and inspections to identify any abnormalities that could impact the quality and performance of the final chip. The primary aim is fault detection and classification (FDC), for which a range of techniques including statistical analysis and machine learning algorithms are commonly employed. In this study, we introduce an innovative approach utilizing an artificial immune system (AIS), inspired by biological mechanisms, for FDC in semiconductor equipment. The main culprits behind process failures are shifts caused by the aging of parts and modules over time. Our methodology integrates state variable identification (SVID) data, reflecting current equipment conditions, and optical emission spectroscopy (OES) data, capturing plasma process information under faulty scenarios induced by deliberate gas flow rate adjustments in semiconductor fabrication. Our results demonstrate a modeling prediction accuracy of 94.69% when incorporating selected SVID and OES data, and 93.68% accuracy using OES data alone. In conclusion, we suggest the potential application of AIS in semiconductor process decision-making, offering promising avenues for enhancing fault detection in semiconductor equipment.